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http://dspace.mediu.edu.my:8181/xmlui/handle/10261/3457Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.creator | Bastiaansen, Cees | - |
| dc.creator | Broer, Dirk, J. | - |
| dc.creator | Sánchez-Somolinos, Carlos | - |
| dc.date | 2008-04-07T12:22:32Z | - |
| dc.date | 2008-04-07T12:22:32Z | - |
| dc.date | 2006-08-17 | - |
| dc.date.accessioned | 2017-01-31T01:01:36Z | - |
| dc.date.available | 2017-01-31T01:01:36Z | - |
| dc.identifier | International Publication Number: WO 2006/085757 A3 | - |
| dc.identifier | http://hdl.handle.net/10261/3457 | - |
| dc.identifier.uri | http://dspace.mediu.edu.my:8181/xmlui/handle/10261/3457 | - |
| dc.description | Filing Date: 2006-02-09. --Priority Data: NL PCT/NL2005/000106 (2005-02-09) | - |
| dc.description | The present invention relates to a process for the preparation of a polymeric relief structure by a) coating a substrate with a first coating composition comprising one or more radiation-sensitive ingredients, d) locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, e) polymerizing and/or crosslinking the resulting coated substrate to a first coating. This process is improved by applying a second coating composition on top of the first coating composition, said second coating composition comprising either an organic compound (Co) of a monomeric nature and wherein Co is also polymerized during the process, or wherein said second coating comprises a dissolved polymer (Cp). As a result a polymeric relief structure is obtained, where a substrate is coated with a functional, stacked, bi-layer, in which each layer exhibits a specific, and from each other differing function. | - |
| dc.format | 151821 bytes | - |
| dc.format | application/pdf | - |
| dc.language | eng | - |
| dc.rights | openAccess | - |
| dc.title | Process for preparing a polymeric relief structure | - |
| dc.type | Patente | - |
| Appears in Collections: | Digital Csic | |
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