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http://dspace.mediu.edu.my:8181/xmlui/handle/10261/4887| Title: | Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography |
| Keywords: | Metallic thin films Magnetoresistance Permalloy Nanocontacts Electron beam lithography |
| Publisher: | American Institute of Physics |
| Description: | 15 pages, 4 figures. Accepted by APL.-- Final full-text version published 24 Aug 2006, available at: http://dx.doi.org/10.1063/1.2337538 In this paper we show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200nm. These nanoconstrictions were fabricated combining electron beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. We compare the experimental results with the theoretical estimation of the electrical resistance. Finally we show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20mV at 20 Oe. This work has been supported by the BMR-NMP-EU project. Peer reviewed |
| URI: | http://dspace.mediu.edu.my:8181/xmlui/handle/10261/4887 |
| Other Identifiers: | arXiv:cond-mat/0607608v1 [cond-mat.mtrl-sci] 0003-6951 http://hdl.handle.net/10261/4887 10.1063/1.2337538 |
| Appears in Collections: | Digital Csic |
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