Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/2772
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dc.creatorBernussi A.A.-
dc.creatorCarvalho Jr. W.-
dc.creatorFurtado M.T.-
dc.creatorGobbi A.L.-
dc.date1999-
dc.date.accessioned2013-05-29T23:30:55Z-
dc.date.available2013-05-29T23:30:55Z-
dc.date.issued2013-05-30-
dc.identifierhttp://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400027-
dc.identifierhttp://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=746-
dc.identifier.urihttp://koha.mediu.edu.my:8181/jspui/handle/123456789/2772-
dc.descriptionStrained and partially relaxed In1-xGa xAs yP1-y /InP single quantum wells (SQWs) with different cap layer thicknesses and biaxial strain values grown by low-pressure metalorganic vapor phase epitaxy (LP-MOVPE) were investigated by double crystal X-ray diffraction, photoluminescence microscopy (PLM) imaging and photoluminescence spectroscopy techniques. Our results indicate a significant improvement of the optical quality of the quaternary wells with increasing values of the cap layer thickness. Tensile and compressive strained In1-xGa xAs yP1-y /InP SQWs grown with the same structure exhibited different relaxation processes, even when the strain magnitude was the same. PLM images of highly compressive quantum wells exhibited a large number of dark lines corresponding to misfit dislocations as a result of the partial relaxation process in the well material. PLM images of similar tensile strained samples revealed only the presence of dark spots with no evidence of misfit dislocations.-
dc.publisherSociedade Brasileira de Física-
dc.sourceBrazilian Journal of Physics-
dc.titleStrain and relaxation processes in In1-xGaxAsyP1-y/ InP single quantum wells grown by LP-MOVPE-
Appears in Collections:Physics and Astronomy

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