Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy

Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/2784

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DC Field	Value	Language
dc.creator	Gutiérrez H.R.	-
dc.creator	Cotta M.A.	-
dc.creator	Nakaema W.M.	-
dc.creator	Carvalho M.M.G.de	-
dc.creator	Gobbi A.L.	-
dc.date	1999	-
dc.date.accessioned	2013-05-29T23:32:55Z	-
dc.date.available	2013-05-29T23:32:55Z	-
dc.date.issued	2013-05-30	-
dc.identifier	http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400031	-
dc.identifier	http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=764	-
dc.identifier.uri	http://koha.mediu.edu.my:8181/jspui/handle/123456789/2784	-
dc.description	We have observed changes in the morphology of InP films grown in epi-ready substrates and on patterns created by photo and plow-mode AFM lithography. These changes are attributed to different levels of contamination of the surface, which favor nucleation of clusters over a two-dimensional film for the lithography-processed surface. The area of nucleation is smaller than the dimensions of the patterns created by lithography, so no size effects due to the presence of the pattern could be observed. The film morphologies exhibited well defined exponents for system sizes smaller than 0.2 mum but no defined growth exponent.	-
dc.publisher	Sociedade Brasileira de Física	-
dc.source	Brazilian Journal of Physics	-
dc.title	Size effects on the growth mode and roughness of sub-micron structures grown by selective area epitaxy	-
Appears in Collections:	Physics and Astronomy

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