Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/2817
Title: Theoretical study of surfactant action of Te on Si(001)/Ge surfaces
Issue Date: 30-May-2013
Publisher: Sociedade Brasileira de Física
Description: We have performed first-principles total energy calculations to investigate the adsorption process of Ge on Si(001)/Te, and the surfactant action of Te during the epitaxial deposition of Ge on Si(001)/Te, based on an atomic exchange process, Ge <-> Te. The total energy calculation indicates that the adsorption of Ge atom in "vacancy" site is energetically more favourable than its adsorption in "bridge" site. The adsorption of Ge in "on-top" and "anti-bridge" sites can be ruled out. The segregation process of Te atoms, based on an atomic exchange mechanism, reduces the total energy of the surface, confirming the surfactant effect of Te atoms.
URI: http://koha.mediu.edu.my:8181/jspui/handle/123456789/2817
Other Identifiers: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400042
http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=810
Appears in Collections:Physics and Astronomy

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