Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/2828
Title: Vacancy diffusion in silicon: analysis of transition state theory
Issue Date: 30-May-2013
Publisher: Sociedade Brasileira de Física
Description: Transition state theory (TST) is the most widely used formalism for theoretical calculations of diffusion coeffcients of defects in solids. In this work, we test its validity for the case of vacancy diffusion in silicon. The diffusion coefficient directly obtained from molecular-dynamics simulations with a classical (Stillinger-Weber) potential is compared with TST predictions. Our results confirm the validity of TST for this system.
URI: http://koha.mediu.edu.my:8181/jspui/handle/123456789/2828
Other Identifiers: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97331999000400046
http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=1999&volume=29&issue=4&spage=828
Appears in Collections:Physics and Astronomy

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