Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/3015
Title: Plasma-deposited a-C(N): H films
Issue Date: 30-May-2013
Publisher: Sociedade Brasileira de Física
Description: The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.
URI: http://koha.mediu.edu.my:8181/jspui/handle/123456789/3015
Other Identifiers: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332000000300007
http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2000&volume=30&issue=3&spage=517
Appears in Collections:Physics and Astronomy

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