Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/3018
Title: Hardness and stress of amorphous carbon films deposited by glow discharge and ion beam assisting deposition
Issue Date: 30-May-2013
Publisher: Sociedade Brasileira de Física
Description: The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp²-rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp³ sites. Furthermore, the same results also indicate that the sp² sites may also contribute to the hardness of the films.
URI: http://koha.mediu.edu.my:8181/jspui/handle/123456789/3018
Other Identifiers: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332000000300008
http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2000&volume=30&issue=3&spage=527
Appears in Collections:Physics and Astronomy

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