Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/3420
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dc.creatorHanamoto L. K.-
dc.creatorHenriques A. B.-
dc.creatorTribuzy C. V.-B.-
dc.creatorSouza P. L.-
dc.creatorYavich B.-
dc.creatorAbramof E.-
dc.date2002-
dc.date.accessioned2013-05-30T01:49:48Z-
dc.date.available2013-05-30T01:49:48Z-
dc.date.issued2013-05-30-
dc.identifierhttp://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332002000200023-
dc.identifierhttp://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2002&volume=32&issue=2a&spage=334-
dc.identifier.urihttp://koha.mediu.edu.my:8181/jspui/handle/123456789/3420-
dc.descriptionThe interfaces in InP=In0.53 Ga0.47As superlattices modulation doped with Si were investigated using magneto-transport, capacitance-voltage, and high resolution X-ray diffraction measurements. Results indicate that a thick interfacial layer is formed when InP is grown on top of In xGa1-xAs, and that Si atoms that fall in the interfacial layer have a high probability of not forming a shallow donor center. Using a simple theoretical model the width of the interfacial layer which was estimated to be 7±1 monolayers.-
dc.publisherSociedade Brasileira de Física-
dc.sourceBrazilian Journal of Physics-
dc.titleInterfacial layers and impurity segregation in InP/In0.53Ga0.47As superlattices-
Appears in Collections:Physics and Astronomy

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