Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/123456789/8000
Title: Electron field emission measurements from boron-doped CVD diamond on tantalum
Issue Date: 1-Jun-2013
Publisher: Sociedade Brasileira de Física
Description: Boron-doped polycrystaline diamond films grown by hot-filament-assisted chemical vapor deposition were studied with ultraviolet photoemission spectroscopy (UPS), Raman spectroscopy, X-ray diffractometry and current voltage measurements. The UPS measurement shows that the work function (phi) without electric field is about 3.9 eV . The field-emission current-voltage measurements indicate a threshold voltage ranging from 8.97x106 to 9.64x106 V=m and a work function (phi) about 0.3 eV . These results show that boron doped diamond films exhibit a negative electron affinity in high electric field.
URI: http://koha.mediu.edu.my:8181/jspui/handle/123456789/8000
Other Identifiers: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332003000100006
http://www.doaj.org/doaj?func=openurl&genre=article&issn=01039733&date=2003&volume=33&issue=1&spage=94
Appears in Collections:Physics and Astronomy

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