Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/2427
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dc.contributorLongtin, Mark D.-
dc.contributorWein, Lawrence M.-
dc.contributorWelsch, Roy E.-
dc.date2003-04-29T05:07:18Z-
dc.date2003-04-29T05:07:18Z-
dc.date2003-04-29T05:07:18Z-
dc.date.accessioned2013-06-01T01:19:38Z-
dc.date.available2013-06-01T01:19:38Z-
dc.date.issued2013-06-01-
dc.identifier# 3452-92-MSA-
dc.identifierhttp://hdl.handle.net/1721.1/2427-
dc.identifier.urihttp://koha.mediu.edu.my:8181/jspui/handle/1721-
dc.descriptionMark D. Longtin, Lawrence M. Wein and Roy E. Welsch.-
dc.descriptionIncludes bibliographical references (p. 41-42).-
dc.descriptionSupported by a grant from the Leaders for Manufacturing Program at MIT, and a grant from the National Science Foundation. DDM-9057297-
dc.format45 p.-
dc.format3295116 bytes-
dc.formatapplication/pdf-
dc.languageeng-
dc.publisherAlfred P. Sloan School of Management, Massachusetts Institute of Technology, 1992.-
dc.relationWorking paper (Sloan School of Management) ; 3452-92.-
dc.subjectHD28 .M414 no.3452-, 92-
dc.titleSequential screening in semiconductor manufacturing.-
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