Please use this identifier to cite or link to this item: http://dspace.mediu.edu.my:8181/xmlui/handle/1721.1/7368
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dc.creatorVajpeyi, Agam P.-
dc.creatorChua, Soo-Jin-
dc.creatorTripathy, S.-
dc.creatorFitzgerald, Eugene A.-
dc.date2004-12-10T14:02:52Z-
dc.date2004-12-10T14:02:52Z-
dc.date2005-01-
dc.date.accessioned2013-10-09T02:49:25Z-
dc.date.available2013-10-09T02:49:25Z-
dc.date.issued2013-10-09-
dc.identifierhttp://hdl.handle.net/1721.1/7368-
dc.identifier.urihttp://koha.mediu.edu.my:8181/xmlui/handle/1721-
dc.descriptionNanoporous GaN films are prepared by UV assisted electrochemical etching using HF solution as an electrolyte. To assess the optical quality and morphology of these nanoporous films, micro-photoluminescence (PL), micro-Raman scattering, scanning electron microscopy (SEM), and atomic force microscopy (AFM) techniques have been employed. SEM and AFM measurements revealed an average pore size of about 85-90 nm with a transverse dimension of 70-75 nm. As compared to the as-grown GaN film, the porous layer exhibits a substantial photoluminescence intensity enhancement with a partial relaxation of compressive stress. Such a stress relaxation is further confirmed by the red shifted E₂(TO) phonon peak in the Raman spectrum of porous GaN.-
dc.descriptionSingapore-MIT Alliance (SMA)-
dc.format2415487 bytes-
dc.formatapplication/pdf-
dc.languageen-
dc.relationAdvanced Materials for Micro- and Nano-Systems (AMMNS);-
dc.subjectgallium nitride-
dc.subjectporous semiconductors-
dc.subjectultraviolet assisted electrochemical etching-
dc.subjectnanoporous GaN film-
dc.titleHigh Optical Quality Nanoporous GaN Prepared by Photoelectrochemical Etching-
dc.typeArticle-
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