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Charge storage in nanocrystal systems: Role of defects?

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dc.creator Kan, Eric Win Hong
dc.creator Choi, Wee Kiong
dc.creator Chim, Wai Kin
dc.creator Antoniadis, Dimitri A.
dc.creator Fitzgerald, Eugene A.
dc.date 2003-12-08T16:37:09Z
dc.date 2003-12-08T16:37:09Z
dc.date 2004-01
dc.date.accessioned 2013-10-09T02:32:31Z
dc.date.available 2013-10-09T02:32:31Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/3798
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description Wet thermal oxidations of polycrystalline Si₀.₅₄Ge₀.₄₆ films at 600°C for 30 and 50 min were carried out. A stable mixed oxide was obtained for films that were oxidized for 50 min. For film oxidized for 30 min, however, a mixed oxide with Ge nanocrystallites embedded in the oxide matrix was obtained. A trilayer gate stack structure that consisted of tunnel oxide/oxidized polycrystalline Si₀.₅₄Ge₀.₄₆/rf sputtered SiO₂ layers was fabricated. We found that with a 30 min oxidized middle layer, annealing the structure in N₂ ambient results in the formation of germanium nanocrystals and the annealed structure exhibits memory effect. For a trilayer structure with middle layer oxidized for 50 min, annealing in N₂ showed no nanocrystal formation and also no memory effect. Annealing the structures with 30 or 50 min oxidized middle layer in forming gas ambient resulted in nanocrystals embedded in the oxide matrix but no memory effect. This suggests that the charge storage mechanism for the trilayer structure is closely related to the interfacial traps of the nanocrystals.
dc.description Singapore-MIT Alliance (SMA)
dc.format 469856 bytes
dc.format application/pdf
dc.language en_US
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject charge storage
dc.subject defects
dc.subject germanium nanocrystals
dc.subject quantum dots
dc.title Charge storage in nanocrystal systems: Role of defects?
dc.type Article


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