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Growth and Properties of (001)-oriented Pb(Zr₀.₅₂Ti₀.₄₈)O₃/LaNiO₃ Films on Si(001) Substrates with TiN Buffer Layers

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dc.creator Zhu, Tie-Jun
dc.creator Lu, Li
dc.creator Thompson, Carl V.
dc.date 2003-12-13T16:43:24Z
dc.date 2003-12-13T16:43:24Z
dc.date 2004-01
dc.date.accessioned 2013-10-09T02:32:39Z
dc.date.available 2013-10-09T02:32:39Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/3829
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description Pulsed laser deposition has been used to grow Pb(Zr₀.₅₂Ti₀.₄₈)O₃ (PZT)/LaNiO₃ (LNO) heterostructures with restricted crystallographic orientations on bare Si(001) and SiO₂-coated Si(001) substrates, using TiN buffer layers. The effect of background gas pressure on orientation of the thin films was investigated in detail. XRD analyses showed that under optimized conditions, (001)-oriented PZT/LNO/TiN heterostructures could be grown on either Si(001) or SiO₂/Si substrates. The (001)-textured PZT films had remnant polarizations as high as 23µC/cm², and also had a low coercive field. Up to 10¹⁰ switching cycles have been achieved in these PZT films.
dc.description Singapore-MIT Alliance (SMA)
dc.format 372225 bytes
dc.format application/pdf
dc.language en_US
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject pulsed laser deposition
dc.subject ferroelectric thin films
dc.subject PZT
dc.subject crystallographic orientation
dc.subject ferroelectric properties
dc.title Growth and Properties of (001)-oriented Pb(Zr₀.₅₂Ti₀.₄₈)O₃/LaNiO₃ Films on Si(001) Substrates with TiN Buffer Layers
dc.type Article


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