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Micro Raman Spectroscopy of Annealed Erbium Implanted GaN

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dc.creator Vajpeyi, Agam P.
dc.creator Chua, Soo-Jin
dc.creator Fitzgerald, Eugene A.
dc.creator Tripathy, S.
dc.date 2003-12-13T17:22:54Z
dc.date 2003-12-13T17:22:54Z
dc.date 2004-01
dc.date.accessioned 2013-10-09T02:32:44Z
dc.date.available 2013-10-09T02:32:44Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/3834
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description Wurtzite GaN epilayers grown by metal organic chemical vapor deposition on sapphire substrates were subsequently ion implanted with Er to a dose of 5×10¹⁵ cm⁻². The implanted samples were annealed in nitrogen atmosphere at different temperatures to facilitate recovery from implantation related damage. In this paper we report the annealing behavior of Erbium implanted GaN by using micro Raman spectroscopy and optimized annealing condition. We have observed almost full damage recovery of the crystalline quality of Er implanted GaN after annealing at 1000°C for 2 minute. This observation is further confirmed by using AFM images.
dc.description Singapore-MIT Alliance (SMA)
dc.format 282979 bytes
dc.format application/pdf
dc.language en_US
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject annealing
dc.subject damage recovery
dc.subject Erbium implantation
dc.subject Raman spectroscopy
dc.title Micro Raman Spectroscopy of Annealed Erbium Implanted GaN
dc.type Article


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