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Review of Direct Metal Bonding for Microelectronic Interconnections

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dc.creator Zhang, G.G.
dc.creator Wong, Chee Cheong
dc.date 2003-12-13T17:46:30Z
dc.date 2003-12-13T17:46:30Z
dc.date 2004-01
dc.date.accessioned 2013-10-09T02:32:44Z
dc.date.available 2013-10-09T02:32:44Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/3840
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description Microelectronic interconnections require advanced joining techniques. Direct metal bonding methods, which include thercomsonic and thermocompression bonding, offer remarkable advantages over soldering and adhesives joining. These processes are reviewed in this paper. The progress made in this area is outlined. Some work concerned with the bonding modeling is also presented. This model is based on the joint interface mechanics resulting from compression. Both bump and substrate deformation are taken into account. The improved understanding of the relationship between the deformation and bonding formation may provide more accurate joint evaluation criterion.
dc.description Singapore-MIT Alliance (SMA)
dc.format 343178 bytes
dc.format application/pdf
dc.language en_US
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject direct metal bonding
dc.subject microelectronic interconnections
dc.subject bump deformation
dc.subject substrate deformation
dc.subject thermosonic bonding
dc.subject compression modeling
dc.subject thermocompression bonding
dc.title Review of Direct Metal Bonding for Microelectronic Interconnections
dc.type Article


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