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TiNi-based thin films for MEMS applications

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dc.creator Fu, Yongqing
dc.creator Du, Hejun
dc.creator Huang, Weimin
dc.creator Zhang, Sam
dc.creator Hu, Min
dc.date 2003-12-13T17:59:05Z
dc.date 2003-12-13T17:59:05Z
dc.date 2004-01
dc.date.accessioned 2013-10-09T02:32:47Z
dc.date.available 2013-10-09T02:32:47Z
dc.date.issued 2013-10-09
dc.identifier http://hdl.handle.net/1721.1/3844
dc.identifier.uri http://koha.mediu.edu.my:8181/xmlui/handle/1721
dc.description In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design. Different types of MEMS applications were reviewed and the prospects for future advances in fabrication process and device development were discussed.
dc.description Singapore-MIT Alliance (SMA)
dc.format 297584 bytes
dc.format application/pdf
dc.language en_US
dc.relation Advanced Materials for Micro- and Nano-Systems (AMMNS);
dc.subject shape-memory
dc.subject TiNi
dc.subject sputtering
dc.subject thin films
dc.subject MEMS
dc.subject microactuator
dc.subject microsensor
dc.title TiNi-based thin films for MEMS applications
dc.type Article


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