| dc.contributor |
Atwater, Harry Albert, 1960- |
|
| dc.date |
2004-03-02T18:51:18Z |
|
| dc.date |
2004-03-02T18:51:18Z |
|
| dc.date |
1987 |
|
| dc.date.accessioned |
2013-10-09T02:34:30Z |
|
| dc.date.available |
2013-10-09T02:34:30Z |
|
| dc.date.issued |
2013-10-09 |
|
| dc.identifier |
no 527 |
|
| dc.identifier |
http://hdl.handle.net/1721.1/4216 |
|
| dc.identifier.uri |
http://koha.mediu.edu.my:8181/xmlui/handle/1721 |
|
| dc.description |
Harry Albert Atwater, Jr. |
|
| dc.description |
Bibliography: p. 213-224. |
|
| dc.description |
Supported in part by the National Science Foundation ECS-85-06565 Supported in part by the U.S. Air Force grnat AFOSR 85-0154C |
|
| dc.format |
224 p. |
|
| dc.format |
8891532 bytes |
|
| dc.format |
application/pdf |
|
| dc.language |
eng |
|
| dc.publisher |
Massachusetts Institute of Technology, Research Laboratory of Electronics |
|
| dc.relation |
Technical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 527. |
|
| dc.subject |
TK7855.M41 R43 no.527 |
|
| dc.title |
Ion beam enhanced grain growth in thin films |
|